Furnace Annealing

Views Updated: Dec 15, 2025

Abbreviation

Pronunciation

/ˈfərnəs əˈnilɪŋ/

Effect of Bell Furnace Annealing(FA) on Surface Quality of Type 430 Stainless Steels
This article presents and discusses main recrystallization technology of amorphous silicon thin films, including conventional furnace annealing, metal-induced crystallization, microwave-induced crystallization, rapid thermal annealing and laser crystallization.
The effects of high temperature treatment by conventional furnace annealing and rapid thermal processing ( RTP ) on the dissolution and the re-growth behavior of oxygen precipitation in Czochralski ( CZ ) silicon wafers are investigated.
After analysis, it is considered that the two techniques of rapid thermal annealing and conventional furnace annealing are most fitful and most probably applicable to the industrial productivity of polycrystalline silicon thin-film solar cells.
At present the main recrystallization techniques employed at home and abroad include conventional furnace annealing, rapid photo-thermal annealing ( RPTA ), metal-induced crystallization, microwave-induced crystallization, and laser crystallization and so on.

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