Interference Lithography

Views Updated: Dec 15, 2025

Abbreviation

Pronunciation

/ˌɪnərˈfɪrəns ləˈθɑgrəfi/

Optical head supporting sub wavelength structure with UV interference lithography
The fabrication methods of MPC include electron beam lithography with subsequent evaporation and lift-off, interference lithography with dry-etching technology etc.
The limiting feature sizes of laser interference lithography were investigated by changing the variable of energy density.
The results show that the method is effective and antinoise in measuring the laser interference lithography patterns.
The results will be useful for the design and alignment of laser interference systems to obtain the desired patterns, in particular for laser interference lithography applications.

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