Low-Temperature Chemical Vapor Deposition
Key Facts
Abbreviation
LTCVD
Pronunciation
/loʊ ˈtɛmpərəʧər ˈkɛmɪkəl ˈveɪpər ˌdɛpəˈzɪʃən/
Category
Academic & Science
Related Field
Electronics
Examples in Context
- Low-temperature polycrystalline Si films were fabricated by radio frequency plasma-enhanced chemical vapor deposition using SiH_4, Ar and H_2 as source gas.