Resist LIthography

Views Updated: Dec 15, 2025

Abbreviation

RLI

Pronunciation

/rɪˈzɪst ləˈθɑgrəfi/

Research of SU-8 Resist Lithography Using Ultraviolet Laser
The simulation results show that the development profile of thick resist based on new exposure model is consistent with the experimental result, and the imaging mechanism of thick resist lithography is discussed.
So its experiment process is different from that of traditional lithography technique and there are many complicated factors affecting the imaging quality in thick resist lithography.
Thick resist lithography is a kind of technique fabricating deep relief structures. Resist thickness used in the process usually is beyond 2 u m, even to hundred micrometers.
So developing an appropriate thick resist exposure model is important to study the transferring mechanism of figures in the resist and develop the whole thick resist lithography technique.

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