Shallow Trench Isolation

Views Updated: Dec 15, 2025

Key Facts

Abbreviation
STI
Pronunciation
/ˈʃæloʊ trɛnʧ ˌaɪsəˈleɪʃən/
Category
Academic & Science
Related Field
Electronics

Examples in Context

  1. And then this thesis analyses the single element package, tip pressure and shallow trench isolation technology. Finally, the chip designed in this paper is summarized and the trend of this research is introduced.
  2. Shallow Trench Isolation(STI) Process for Deep Sub - Micron Technologies
  3. The chemical mechanical planarization ( CMP ) in semiconductor manufacturing technology is today the formation of shallow trench isolation ( STI ) of the key technologies.
  4. Chemical mechanical planarization ( CMP ) technique is a key process enabling shallow trench isolation ( STI ) in semiconductor manufacture today, which is used in current integrated circuit manufacturing processes to achieve device isolation.
  5. For STI planarization, CMP-based polishing consider different density graphics uniformity, traditional shallow trench isolation planarization ( STI CMP ) process has been unable to meet the requirements.

Other meanings of STI